Cvd Graphene Copper Etching

Graphene grown on copper by chemical vapor deposition cvd has been significantly explored for the synthesis of high quality graphene since the popular recipe for single layer graphene growth was introduced in 2009 1 many years after the first report of the deposition of graphene on cu in 1992 2.

Cvd graphene copper etching.

The pmma pva graphene copper foil block was floated on the surface of a solution of 0 3 m ammonium persulfate aldrich 98 at 0 c for 24 h to etch the copper foil. By exposing cvd graphene on copper foil to hydrogen flow around 800 c we observed that the initially continuous graphene can be etched to have many hexagonal openings. Advanced materials 2016 28 29 6247 6252. We report a simple clean and highly anisotropic hydrogen etching method for chemical vapor deposited cvd graphene catalyzed by the copper substrate.

If the raman spectra of bilayer graphene transferred to pet wafer is compared to that the one of bilayer graphene on copper figure 2 a it can be concluded that the different transfer steps affected the. 2a and b show the etching time evolution of the graphene domain size on the copper foils etched by an fecl 3 or an nh 4 2 s 2 o 8 etchant. For the fecl 3 etchant we found that the average size of the. In addition we found that the etching is temperature dependent.

Figure 4 shows the raman spectra of the cvd grown bilayer graphene transferred onto pet wafers using the three different etching solutions. After the copper was etched the pmma pva graphene block was rinsed with deionized water three times at 0 c and transferred onto a 100 nm thick sio 2 si substrate.